Fremont, CA, United States of America

Helen H Zhu

This inventor holds 22 USPTO granted patents and 2 published patent applications and 1 EPO patent, primarily in Plasma Etching. Top assignee: Lam Research Corporation. Active years: 1997-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Helen H Zhu. Retrieved from https://idiyas.com/inventor/helen-h-zhu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 72.7

 

Average Co-Inventor Count = 3.5

ph-index = 9

Forward Citations = 353(Granted Patents)


Location History:

  • Santa Clara, CA (US) (1997)
  • Milpitas, CA (US) (1997 - 2001)
  • Fremont, CA (US) (2003 - 2019)

Company Filing History:


Years Active: 1997-2019

Loading Chart...
Loading Chart...
Areas of Expertise:
Plasma Etching
Low-k Materials
Silicon Nitride
Tungsten Etching
Dielectric Materials
Photoresist
Nitrous Oxide
Barrier Materials
Trench Etch
Organic Low-k Materials
Silicon Carbide
Selectivity
22 patents (USPTO):Explore Patents

Title: Innovations of Helen H Zhu in Semiconductor Technology

Introduction

Helen H Zhu is a notable inventor based in Fremont, CA, recognized for her significant contributions to semiconductor technology. With a total of 22 patents to her name, her work focuses primarily on advanced etching methods, which are essential in the manufacturing processes of semiconductor devices. Her innovative techniques are pushing the boundaries of what is achievable in the realm of microelectronics.

Latest Patents

Among her recent inventions are the patents titled "Systems and methods for ultrahigh selective nitride etch" and "Method for achieving ultra-high selectivity while etching silicon nitride." The first patent details a method for selectively etching a silicon nitride layer on a substrate using an inductively coupled plasma. This method involves a specialized substrate processing chamber equipped with a gas dispersion device, which enables precise etching of silicon nitride while promoting passivation of silicon dioxide and polysilicon. The second patent outlines techniques for enhancing etch selectivity of silicon nitride over silicon-containing materials by introducing silicon from solid or fluidic sources into the plasma during the etch process. These advancements have broad implications for improving the efficiency and effectiveness of semiconductor fabrication.

Career Highlights

Helen H Zhu is currently associated with Lam Research Corporation, a leading company in the semiconductor equipment industry. Throughout her career, she has continuously developed and refined etching technologies that have substantially influenced the production of microelectronic components. Her dedication to innovation has positioned her as a key figure in the field.

Collaborations

Helen has collaborated with esteemed colleagues, including S M Reza Sadjadi and Joon Hong Park, who share her commitment to advancing semiconductor technologies. These collaborations have fostered an environment that encourages ingenuity and the effective resolution of complex engineering challenges, further contributing to the field's growth.

Conclusion

Helen H Zhu's remarkable achievements and continued innovation in semiconductor technology exemplify her dedication to excellence in her field. With her extensive portfolio of patents and collaborative efforts, she is not only enhancing technology but also paving the way for future advancements in the industry. Her work stands as a testament to the critical role of inventors in shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…