This inventor holds 9 USPTO granted patents. Top assignees: Kabushiki Kaisha Toshiba, Semiconductor Technology Academic Research Center, Toshiba Electronic Devices & Storage Corporation. Active years: 2007-2020.
Location History:
- Soka, JP (2009 - 2010)
- Oita-ken, JP (2011)
- Oita, JP (2011)
- Yokohama, JP (2007 - 2012)
- Tokyo, JP (2020)
Company Filing History:
6 out of 53,240 
3 out of 135 
1 out of 1,696 Years Active: 2007-2020
Title: Hayato Nasu: Innovator in Semiconductor Technology
Introduction
Hayato Nasu is a prominent inventor based in Yokohama, Japan, known for his significant contributions to semiconductor technology. With a total of nine patents to his name, Nasu has made remarkable advancements in the field of solid-state imaging devices and semiconductor manufacturing processes.
Latest Patents
Nasu's latest patents include a solid-state imaging device that features innovative interconnect layers. This device incorporates a first interconnect layer and a second interconnect layer, with an insulating layer positioned between them. The design includes a barrier metal film on the surface of the first interconnect layer, while the second interconnect layer remains free of this film. Additionally, plugs connect the two interconnect layers, arranged at a spacing of 200 micrometers or less along the longitudinal direction of the second layer. Another notable patent is for a semiconductor device with a barrier film, which outlines a method of manufacturing that involves forming an opening in an interlevel insulating film on a semiconductor substrate. This method includes the use of an auxiliary film containing a predetermined metal element, which is crucial for creating a barrier film on the interlevel insulating film.
Career Highlights
Throughout his career, Hayato Nasu has worked with esteemed organizations such as Toshiba Corporation and the Semiconductor Technology Academic Research Center. His experience in these companies has allowed him to develop and refine his innovative ideas, contributing to