Company Filing History:
Years Active: 2016-2024
Title: The Innovative Contributions of Hau-Yu Lin
Introduction
Hau-Yu Lin is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on advanced methods and structures that enhance the performance and efficiency of semiconductor devices.
Latest Patents
Among his latest patents is a method of metal gate formation and structures formed by the same. This method involves several steps, including providing a first gate electrode over a substrate, forming a first pair of spacers on either side of the gate electrode, and depositing a dielectric layer in the trench created after removing the gate electrode. Another notable patent is for a wrap-around contact on FinFET, which describes a fin structure on a substrate that includes an epitaxial region with a contact structure designed to improve electrical performance.
Career Highlights
Hau-Yu Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative work has contributed to the advancement of semiconductor technologies, making him a valuable asset to his company and the industry as a whole.
Collaborations
He has collaborated with notable coworkers such as Clement Hsingjen Wann and Chih-Hsin Ko, further enhancing the innovative environment in which he works.
Conclusion
Hau-Yu Lin's contributions to semiconductor technology through his patents and collaborations highlight his role as a key inventor in the field. His work continues to influence advancements in semiconductor manufacturing and design.