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For the Inventor, By the Inventor

Tokyo, Japan

Haruo Iwasawa

This inventor holds 13 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Silicon Film Technology. Top assignees: Jsr Corporation, Japan Synthetic Rubber Co., Ltd., Seiko Epson Corporation. Active years: 2001-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haruo Iwasawa. Retrieved from https://idiyas.com/inventor/haruo-iwasawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 13 

% Patents Active = 76.9


Average Co-Inventor Count = 4.1

ph-index = 10

Forward Citations = 296(Granted Patents)


Location History:

  • Asahimachi, JP (2003)
  • Mie, JP (2001 - 2007)
  • Tokyo, JP (2002 - 2010)

Company Filing History:

goldMedal12 out of 1,078 
 
Jsr Corporation
 patents
silverMedal1 out of 377 
 
Japan Synthetic Rubber Co., Ltd.
 patents
bronzeMedal1 out of 34,333 
 
Seiko Epson Corporation
 patents
where one patent can have more than one assignee

Years Active: 2001-2010

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Areas of Expertise:
Silicon-Cobalt Film
Radiation-Sensitive Resin
Polysiloxane
Silicon Film
Acid Generator
High Order Silane
Pattern Forming
Bilayer Film
Silicon-Containing Alicyclic Compound
Composition
13 patents (USPTO):Explore Patents
1. 7718228 - Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same (2010-05-18),
2. 7473443 - Composition for forming silicon film and method for forming silicon film (2009-01-06),
3. 7288359 - Radiation-sensitive resin composition (2007-10-30),
4. 7244549 - Pattern forming method and bilayer film (2007-07-17),
5. 7223802 - High order silane composition, and method of forming silicon film using the composition (2007-05-29),
6. 7108955 - Polysiloxane, process for production thereof and radiation-sensitive resin composition (2006-09-19),
7. 6908722 - Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition (2005-06-21),
8. 6846895 - Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition (2005-01-25),
9. 6531260 - Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition (2003-03-11),
10. 6403280 - Radiation sensitive resin composition (2002-06-11),
11. 6322949 - Radiation sensitive resin composition (2001-11-27),
12. 6187504 - Radiation sensitive resin composition (2001-02-13),
13. 6180316 - Radiation sensitive resin composition (2001-01-30),

Title: Haruo Iwasawa: Pioneering Inventor from Tokyo

Introduction: Haruo Iwasawa is a renowned inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Haruo Iwasawa's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles, wearable technology for healthcare monitoring, and sustainable energy solutions for urban environments.

Career Highlights: With over two decades of experience in the tech industry, Haruo Iwasawa has led numerous research projects that have resulted in patented inventions that have revolutionized various sectors. His work has been instrumental in shaping the future of technology.

Collaborations: Throughout his career, Haruo Iwasawa has collaborated with leading tech companies, research institutions, and universities both in Japan and internationally. His collaborative efforts have led to the development of cutting-edge technologies that have had a significant impact on society.

Conclusion: Haruo Iwasawa's passion for innovation and his dedication to pushing the boundaries of technology have solidified his reputation as a visionary inventor in Tokyo and beyond. His contributions continue to inspire the next generation of inventors and shape the future of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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