The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2005
Filed:
Feb. 12, 2003
Haruo Iwasawa, Mie, JP;
Tsutomu Shimokawa, Mie, JP;
Akihiro Hayashi, Mie, JP;
Satoru Nishiyama, Mie, JP;
Haruo Iwasawa, Mie, JP;
Tsutomu Shimokawa, Mie, JP;
Akihiro Hayashi, Mie, JP;
Satoru Nishiyama, Mie, JP;
JSR Corporation, Tokyo, JP;
Abstract
A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III),wherein Aand Aare an acid-dissociable monovalent organic group, Ris hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, Ris monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.