The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2007
Filed:
Apr. 22, 2003
Takashi Aoki, Suwa, JP;
Masahiro Furusawa, Chino, JP;
Yasuo Matsuki, Tokyo, JP;
Haruo Iwasawa, Tokyo, JP;
Yasumasa Kateuchi, Tokyo, JP;
Takashi Aoki, Suwa, JP;
Masahiro Furusawa, Chino, JP;
Yasuo Matsuki, Tokyo, JP;
Haruo Iwasawa, Tokyo, JP;
Yasumasa Kateuchi, Tokyo, JP;
Seiko Epson Corporation, , JP;
JSR Corporation, , JP;
Abstract
It is an object of the present invention to provide a high order silane composition that contains a polysilane having a higher molecular weight than conventionally, this being from the viewpoints of wettability when applying onto a substrate, boiling point and safety, and hence in particular enables a high-quality silicon film to be formed easily, and also a method of forming an excellent silicon film using the composition. The present invention attains this object by providing a high order silane composition containing a polysilane obtained through photopolymerization by irradiating a solution of a photopolymerizable silane or a photopolymerizable like-liquid silane with ultraviolet light. Moreover, the present invention provides a method of forming a silicon film comprising the step of applying such a high order silane composition onto a substrate.