The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2005
Filed:
Jun. 28, 2002
Satoshi Ebata, Tokyo, JP;
Eiji Yoneda, Tokyo, JP;
Tomoki Nagai, Tokyo, JP;
Tatsuya Toneri, Tokyo, JP;
Yong Wang, Tokyo, JP;
Haruo Iwasawa, Tokyo, JP;
Yukio Nishimura, Tokyo, JP;
Satoshi Ebata, Tokyo, JP;
Eiji Yoneda, Tokyo, JP;
Tomoki Nagai, Tokyo, JP;
Tatsuya Toneri, Tokyo, JP;
Yong Wang, Tokyo, JP;
Haruo Iwasawa, Tokyo, JP;
Yukio Nishimura, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A novel photoacid generator containing a structure of the following formula (I),wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Zand Zare individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.