The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2007
Filed:
Aug. 23, 2002
Haruo Iwasawa, Tokyo, JP;
Akihiro Hayashi, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Kazuo Kawaguchi, Tokyo, JP;
Masato Tanaka, Tokyo, JP;
Haruo Iwasawa, Tokyo, JP;
Akihiro Hayashi, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Kazuo Kawaguchi, Tokyo, JP;
Masato Tanaka, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A pattern forming method comprising forming a coating of a radiation-sensitive resin composition, which contains an acid-dissociable group-containing polysiloxane, alkali-insoluble or scarcely alkali-soluble but becoming alkali-soluble when the acid-dissociable group dissociates, on a film containing a polymer with a carbon content of 80 wt % or more and a polystyrene-reduced weight average molecular weight of 500–100,000, an applying radiation to the coating is provided. The method can form minute patterns with a high aspect ratio by suitably selecting a specific etching gas in the dry etching process, without being affected by standing waves.