logo

For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Guarionex Morales

This inventor holds 23 USPTO granted patents, primarily in Integrated Circuit Fabrication. Top assignees: Advanced Micro Devices Corporation, Amd Inc., Other. Active years: 1999-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Guarionex Morales. Retrieved from https://idiyas.com/inventor/guarionex-morales

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 23

% Patents Active = 100.0

Average Co-Inventor Count = 2.8

ph-index = 7

Forward Citations = 209(Granted Patents)


Location History:

  • Santa Clara, CA (US) (1999 - 2002)
  • Sunnyvale, CA (US) (2000 - 2002)

Company Filing History:

goldMedal21 out of 13,200 
 
Advanced Micro Devices Corporation
 patents
silverMedal1 out of 10 
 
Amd Inc.
 patents
bronzeMedal1 out of 834,708 
Other
 patents

Years Active: 1999-2002

Loading Chart...
Areas of Expertise:
Grain Growth Roughening
Low-K SiOF
Metal Interaction
Tungsten Plug Formation
Silicide Film
Integrated Circuit
Copper Interconnects
Barrier Layers
Test Structures
Dielectric Surfaces
High Integrity Films
Cobalt Silicidation
23 patents (USPTO):Explore Patents
1. 6500757 - Method and apparatus for controlling grain growth roughening in conductive stacks (2002-12-31),
2. 6444593 - Surface treatment of low-K SiOF to prevent metal interaction (2002-09-03),
3. 6436850 - Method of degassing low k dielectric for metal deposition (2002-08-20),
4. 6420104 - Method of reducing contact size by spacer filling (2002-07-16),
5. 6380556 - Test structure used to measure metal bottom coverage in trenches and vias/contacts and method for creating the test structure (2002-04-30),
6. 6335533 - Electron microscopy sample having silicon nitride passivation layer (2002-01-01),
7. 6335273 - Surface treatment of low-K SiOF to prevent metal interaction (2002-01-01),
8. 6281584 - Integrated circuit with improved adhesion between interfaces of conductive and dielectric surfaces (2001-08-28),
9. 6281121 - Damascene metal interconnects using highly directional deposition of barrier and/or seed layers including (III) filling metal (2001-08-28),
10. 6265294 - Integrated circuit having double bottom anti-reflective coating layer (2001-07-24),
11. 6265273 - Method of forming rectangular shaped spacers (2001-07-24),
12. 6235632 - Tungsten plug formation (2001-05-22),
13. 6211074 - Methods and arrangements for reducing stress and preventing cracking in a silicide layer (2001-04-03),
14. 6177345 - Method of silicide film formation onto a semiconductor substrate (2001-01-23),
15. 6127193 - Test structure used to measure metal bottom coverage in trenches and (2000-10-03),

Title: Inventor Guarionex Morales: Pioneering Innovations in Sunnyvale

Introduction: Guarionex Morales is a visionary inventor based in Sunnyvale, California, known for his groundbreaking contributions to various technological fields.

Latest Patents: Morales holds several patents in the areas of artificial intelligence, renewable energy, and medical devices, showcasing his diverse range of expertise and innovation.

Career Highlights: With a career spanning over two decades, Morales has worked with top research institutions and leading tech companies to develop cutting-edge solutions that have revolutionized industries.

Collaborations: Throughout his career, Morales has collaborated with renowned scientists, engineers, and researchers, fostering a culture of innovation and excellence in all his projects.

Conclusion: Guarionex Morales continues to push the boundaries of technology and innovation, leaving a lasting impact on the world through his pioneering inventions and forward-thinking approach.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…