The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2002
Filed:
Nov. 03, 2000
Applicant:
Inventors:
Guarionex Morales, Sunnyvale, CA (US);
Jeffrey A. Shields, Sunnyvale, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/144 ;
U.S. Cl.
CPC ...
H01L 2/144 ;
Abstract
An integrated circuit designed to control grain growth induced roughening in a conductive stack is disclosed herein. The conductive stack includes an interconnect metallization layer formed at a low diffusivity temperature of less than 200° C. The interconnect metallization layer includes aluminum doped with copper. The conductive stack further includes subsequent depositions and/or processing involving interconnect metallization layer to be carried out at the low diffusivity temperatures.