The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2001

Filed:

May. 12, 1998
Applicant:
Inventors:

Richard J. Huang, Cupertino, CA (US);

Guarionex Morales, Santa Clara, CA (US);

Assignee:

Advanced Micro Devices, Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/14763 ; H01L 2/1336 ;
U.S. Cl.
CPC ...
H01L 2/14763 ; H01L 2/1336 ;
Abstract

Methods and arrangements that increase the process control during the fabrication of the control gate configuration in a non-volatile memory semiconductor device are provided. The methods and arrangements effectively prevent cracks from developing within a tungsten suicide layer that is part of a control gate structure within a non-volatile memory cell. Cracks within the tungsten silicide layer can affect the performance of the memory cell by increasing the resistance of the control gate configuration. The methods and arrangements prevent cracking of the tungsten silicide layer by minimizing the relative difference between temperatures associated with the deposition of the tungsten suicide layer and deposition of a subsequent overlying cap layer.


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