Earleville, MD, United States of America

Gregory P Muldowney

This inventor holds 48 USPTO granted patents and 3 EPO patents, primarily in Chemical Mechanical Polishing. Top assignees: Rohm and Haas Electronic Materials Cmp Holdings, Inc., Mobil Oil Corporation, Exxonmobil Research and Engineering Company. Active years: 1994-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gregory P Muldowney. Retrieved from https://idiyas.com/inventor/gregory-p-muldowney

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 85.4

 

Average Co-Inventor Count = 1.3

ph-index = 19

Forward Citations = 769(Granted Patents)


Location History:

  • Glen Mills, PA (US) (1994 - 2006)
  • Earleville, MD (US) (2005 - 2012)

Company Filing History:


Years Active: 1994-2012

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Areas of Expertise:
Chemical Mechanical Polishing
Polishing Pad
Slurry Utilization
Groove Configuration
Three-Dimensional Network
Interpenetrating Network
Layered-Filament Lattice
High-Rate Polishing
Multiphase Mixing Device
Surface Characterization
Controlled Wetting
Slurry Consumption
48 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Gregory P. Muldowney

Introduction: Gregory P. Muldowney, an esteemed inventor based in Earleville, MD, has made significant strides in the field of chemical mechanical polishing. With an impressive portfolio of 48 patents, his work has transformed polishing methods and materials used in various technological industries.

Latest Patents: Among Muldowney's noteworthy inventions are technologies designed to enhance the efficiency and effectiveness of chemical mechanical polishing processes. His latest patent details a chemical mechanical polishing method that incorporates shape memory pads. These pads have a polishing layer in a densified state, and their thickness and groove depth can be monitored. They can respond to activating stimuli, transitioning from a densified state to a recovered state, which optimizes the polishing process. Another significant innovation is a high-rate groove pattern polishing pad designed for use with magnetic, optical, and semiconductor substrates. This polishing pad features a unique structure where continuous grooves from the inner region extend uninterrupted to the outer region, enhancing its functionality.

Career Highlights: Throughout his career, Gregory Muldowney has contributed to several prominent companies, including Rohm and Haas Electronic Materials CMP Holdings, Inc. and Mobil Oil Corporation. His role in advancing polishing technologies while working with these industry leaders has solidified his reputation as a top innovator in his field.

Collaborations: Muldowney has collaborated with talented individuals such as Sherri L. Boyd and Carolina L. Elmufdi. Together, they have fostered an environment of innovation that has led to the development of critical polishing technologies, further demonstrating the collaborative spirit in the field of invention.

Conclusion: Gregory P. Muldowney’s dedication to advancing the field of chemical mechanical polishing through his inventions and collaborations underscores his impact as an inventor. With his continued innovations and a strong foundation in technological research, he remains a pivotal figure in shaping future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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