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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7520798 B1

PDFFull Text
Date of Patent:
Apr. 21, 2009

Filed:

Jan. 31, 2007

Polishing pad with grooves to reduce slurry consumption

Applicant:

Gregory P. Muldowney, Earleville, MD (US);

Inventor:

Gregory P. Muldowney, Earleville, MD (US);

Assignee:

Rohm and Haas Electronic Materials CMP Holdings, Inc., Newark, DE (US);

Attorney:

Blake T Biederman

Primary Examiner:

Joseph J Hail, III

Assistant Examiner:

Alvin J Grant

Int. Cl.
CPC ...
B24B 1/00 (2006.01); B24B 7/19 (2006.01); B24B 7/30 (2006.01); B24B 5/00 (2006.01); B24B 29/00 (2006.01); B24D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A chemical mechanical polishing pad having an annular polishing track and a concentric center O. The polishing pad includes a polishing layer having a plurality of pad grooves formed therein. The polishing pad is designed for use with a carrier, e.g., a wafer carrier, that includes a polishing ring having a plurality of carrier grooves. Each of the plurality of pad grooves has a carrier-compatible groove shape configured to enhance the transport of a polishing medium beneath the carrier ring on the leading edge of the carrier ring during polishing.

Find Patent Forward Citations

Muldowney, Gregory. (2009). Polishing pad with grooves to reduce slurry consumption (U.S. Patent No. 7520798). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7520798

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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