The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
May. 19, 2006
Applicants:
Jeffrey J. Hendron, Elkton, MD (US);
Gregory P. Muldowney, Earleville, MD (US);
Inventors:
Jeffrey J. Hendron, Elkton, MD (US);
Gregory P. Muldowney, Earleville, MD (US);
Assignee:
Rohm and Haas Electronic Materials CMP Holdings, Inc., Newark, DE (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 3/30 (2006.01); B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A chemical mechanical polishing pad () that includes a polishing layer () having a set of primary grooves () formed in a polishing surface () of the pad. The pad also includes a set of secondary grooves () that become selectively active as a function of the wear of the polishing layer from polishing.