Gowri Kamarthy

USPTO Granted Patents = 16 (Patent Applications = 8)

Average Co-Inventor Count = 5.8

ph-index = 7

Forward Citations = 498(Granted Patents)

Company Filing History:

16 out of 3,777

Lam Research Corporation

where one patent can have more than one assignee

Years Active: 2012-2024

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16 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12080592 - Film stack simplification for high aspect ratio patterning and vertical scaling (2024-09-03),

2. 10424461 - Controlling ion energy within a plasma chamber (2019-09-24),

3. 10224221 - Internal plasma grid for semiconductor fabrication (2019-03-05),

4. 10141163 - Controlling ion energy within a plasma chamber (2018-11-27),

5. 9633846 - Internal plasma grid applications for semiconductor fabrication (2017-04-25),

6. 9589853 - Method of planarizing an upper surface of a semiconductor substrate in a plasma etch chamber (2017-03-07),

7. 9460894 - Controlling ion energy within a plasma chamber (2016-10-04),

8. 9385003 - Residue free systems and methods for isotropically etching silicon in tight spaces (2016-07-05),

9. 9252238 - Semiconductor structures with coplanar recessed gate layers and fabrication methods (2016-02-02),

10. 9245761 - Internal plasma grid for semiconductor fabrication (2016-01-26),

11. 9230819 - Internal plasma grid applications for semiconductor fabrication in context of ion-ion plasma processing (2016-01-05),

12. 9012243 - Controlling CD and CD uniformity with trim time and temperature on a wafer by wafer basis (2015-04-21),

13. 8999184 - Method for providing vias (2015-04-07),

14. 8852964 - Controlling CD and CD uniformity with trim time and temperature on a wafer by wafer basis (2014-10-07),

15. 8671878 - Profile and CD uniformity control by plasma oxidation treatment (2014-03-18),

Title: Innovator Spotlight - Gowri Kamarthy: Pioneering Plasma Technology

Introduction:

Gowri Kamarthy, a prolific inventor based in Pleasanton, CA, has made significant contributions to the field of semiconductor fabrication through her groundbreaking patents and innovative solutions.

Latest Patents:

Kamarthy's recent patents showcase her expertise in controlling ion energy within a plasma chamber. By utilizing a combination of sinusoidal and nonsinusoidal RF generators, power amplifiers, filters, and electrode systems, she has developed methods for precisely regulating ion energy levels within the chamber. Additionally, her work on internal plasma grids for semiconductor fabrication demonstrates her commitment to advancing etching processes with improved plasma conditions and cooling mechanisms.

Career Highlights:

With an impressive portfolio of 15 patents, Gowri Kamarthy has established herself as a pioneering figure in the semiconductor industry. Her contributions have been particularly impactful at renowned companies such as Lam Research Corporation and Globalfoundries Inc., where she has played a vital role in shaping cutting-edge technologies for semiconductor manufacturing.

Collaborations:

Throughout her career, Kamarthy has collaborated with esteemed professionals in the field, including her coworkers Alex Paterson and Harmeet Singh. These collaborations have not only enriched her work but have also led to the development of innovative solutions that have pushed the boundaries of semiconductor fabrication processes.

Conclusion:

In conclusion, Gowri Kamarthy's dedication to innovation and her relentless pursuit of excellence have solidified her position as a leading inventor in the semiconductor industry. Her pioneering work in plasma technology continues to have a profound impact on semiconductor fabrication processes, paving the way for future advancements in the field.

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