The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2016
Filed:
Feb. 16, 2015
Lam Research Corporation, Fremont, CA (US);
Ming-Shu Kuo, San Ramon, CA (US);
Qinghua Zhong, Fremont, CA (US);
Helene Del Puppo, Fremont, CA (US);
Ganesh Upadhyaya, Pleasanton, CA (US);
Gowri Kamarthy, Pleasanton, CA (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
Systems and methods for etching a substrate include arranging a substrate including a first structure and a dummy structure in a processing chamber. The first structure is made of a material selected from a group consisting of silicon dioxide and silicon nitride. The dummy structure is made of silicon. Carrier gas is supplied to the processing chamber. Nitrogen trifluoride and molecular hydrogen gas are supplied to the processing chamber. Plasma is generated in the processing chamber. The dummy structure is etched.