Company Filing History:
Years Active: 2005-2012
Title: Gerd Reisinger: Innovator in Microlithography
Introduction
Gerd Reisinger is a notable inventor based in Oberkochen, Germany. He has made significant contributions to the field of microlithography, holding a total of 6 patents. His work focuses on projection objectives and exposure systems that are essential in the manufacturing of microelectronic devices.
Latest Patents
Reisinger's latest patents include innovative technologies such as a projection objective for microlithography, a projection exposure apparatus, a projection exposure method, and an optical correction plate. The projection objective is designed to image patterns from an object field to an image field using electromagnetic radiation. It features a plurality of optical elements, including an optical correction plate that is transparent to the operating radiation. This plate has a unique thickness profile and non-rotationally symmetric aspheric surface profiles, which enhance imaging precision. Additionally, his beam delivery system for projection exposure systems utilizes a laser that generates a beam of light with specific line widths, optimizing the performance of the exposure system.
Career Highlights
Throughout his career, Gerd Reisinger has worked with prominent companies in the optics and semiconductor industries, including Carl Zeiss SMT AG and Carl Zeiss SMT GmbH. His expertise in optical systems has positioned him as a key player in advancing microlithography technologies.
Collaborations
Reisinger has collaborated with notable professionals in his field, including Manfred Maul and Martin Schriever. These partnerships have contributed to the development of innovative solutions in projection technology.
Conclusion
Gerd Reisinger's contributions to microlithography and optical systems have significantly impacted the semiconductor industry. His innovative patents and collaborations reflect his dedication to advancing technology in this critical field.