The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2005
Filed:
Jan. 03, 2001
Michael Gerhard, Aalen, DE;
Nils Dieckmann, Aalen, DE;
Christine Sieler, Gerstetten, DE;
Marcus Zehetbauer, Oberkochen, DE;
Martin Schriever, Aalen, DE;
Gerd Reisinger, Oberkochen, DE;
Michael Gerhard, Aalen, DE;
Nils Dieckmann, Aalen, DE;
Christine Sieler, Gerstetten, DE;
Marcus Zehetbauer, Oberkochen, DE;
Martin Schriever, Aalen, DE;
Gerd Reisinger, Oberkochen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
UV light and a fluid are used in a process for the decontamination of microlithographic projection exposure devices with optical elements or portions thereof, in particular of the surfaces of optical elements. A second UV light source is directed for decontamination, in intervals between exposures, toward at least a portion of the optical elements.