The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2009
Filed:
Jun. 08, 2007
Gerd Reisinger, Oberkochen, DE;
Manfred Maul, Aalen, DE;
Paul Graeupner, Aalen, DE;
Martin Schriever, Aalen, DE;
Ulrich Wegmann, Koenigsbronn, DE;
Gerd Reisinger, Oberkochen, DE;
Manfred Maul, Aalen, DE;
Paul Graeupner, Aalen, DE;
Martin Schriever, Aalen, DE;
Ulrich Wegmann, Koenigsbronn, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.