Company Filing History:

13 out of 10,341

Tokyo Electron Limited

patents

2 out of 51

Tokyo Electron Sagami Limited

patents

1 out of 29

Tokyo Electron Tohoku Limited

patents

where one patent can have more than one assignee

Years Active: 1993-2006

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14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7138607 - Determining method of thermal processing condition (2006-11-21),

2. 6922522 - Heat treatment apparatus, calibration method for temperature measuring system of the apparatus, and heat treatment system (2005-07-26),

3. 6847015 - Heat treatment apparatus and controller for heat treatment apparatus and control method for heat treatment apparatus (2005-01-25),

4. 6803548 - Batch-type heat treatment apparatus and control method for the batch-type heat treatment apparatus (2004-10-12),

5. 6787377 - Determining method of thermal processing condition (2004-09-07),

6. 6780795 - Heat treatment apparatus for preventing an initial temperature drop when consecutively processing a plurality of objects (2004-08-24),

7. 6730885 - Batch type heat treatment system, method for controlling same, and heat treatment method (2004-05-04),

8. 6622104 - Heat treatment apparatus, calibration method for temperature measuring system of the apparatus, and heat treatment system (2003-09-16),

9. 6495805 - Method of determining set temperature trajectory for heat treatment system (2002-12-17),

10. 6351105 - Power controlling unit and thermal processing unit (2002-02-26),

11. 6329643 - Method of temperature-calibrating heat treating apparatus (2001-12-11),

12. 5593608 - Temperature control method and apparatus for use in thermal processing (1997-01-14),

13. 5409348 - Substrate transfer method (1995-04-25),

14. 5228114 - Heat-treating apparatus with batch scheme having improved heat (1993-07-13),

Title: Fujio Suzuki: Innovator in Thermal Processing Technology

Introduction

Fujio Suzuki is a prominent inventor based in Shiroyama-Machi, Japan. He has made significant contributions to the field of thermal processing technology, holding a total of 14 patents. His work focuses on improving methods and systems for controlling substrate temperatures during heat treatment processes.

Latest Patents

One of his latest patents is a method for determining a set temperature profile for controlling the substrate temperatures of multiple groups. This invention involves a first heat processing step that controls the temperatures of substrates according to predetermined provisional profiles. It also includes a film-thickness measuring step and a subsequent amending step to ensure uniform film thickness across the groups. Another notable patent is for a heat treatment apparatus that features a temperature estimator and a calibrator for correcting wafer temperature estimates. This apparatus utilizes an offset value from a stored table to enhance the accuracy of temperature measurements during heat treatment processes.

Career Highlights

Fujio Suzuki has worked with notable companies in the semiconductor industry, including Tokyo Electron Limited and Tokyo Electron Sagami Limited. His experience in these organizations has allowed him to develop and refine his innovative technologies in thermal processing.

Collaborations

Fujio has collaborated with esteemed colleagues such as Wenling Wang and Koichi Sakamoto, contributing to advancements in their shared field of expertise.

Conclusion

Fujio Suzuki's contributions to thermal processing technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of more efficient heat treatment systems.

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