Hsinchu, Taiwan

Feng-Ju Chang


Average Co-Inventor Count = 9.6

ph-index = 3

Forward Citations = 111(Granted Patents)


Company Filing History:


Years Active: 2014-2021

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8 patents (USPTO):Explore Patents

Title: **Innovator Spotlight: Feng-Ju Chang**

Introduction

Feng-Ju Chang, an accomplished inventor based in Hsinchu, Taiwan, has made significant contributions to the field of integrated circuit manufacturing. With a total of 8 patents to his name, Chang has focused on advancing optical proximity correction methodologies, which are vital for enhancing lithography printability in modern semiconductor fabrication.

Latest Patents

Chang's latest innovations include two notable patents that leverage computational lithography techniques. The first patent outlines an optical proximity correction (OPC) methodology that utilizes pattern classification for target placement. This exemplary mask optimization method involves generating target points from an integrated circuit (IC) design layout and performing OPC to produce a modified IC design layout. By selecting models based on the classification of the IC pattern, the method ensures higher precision in lithography.

The second patent describes a method for integrated circuit manufacturing, which includes a systematic approach to identifying and correcting location effects in IC regions. This process utilizes computer programs to modify initial IC patterns into corrected versions, ensuring consistency across the manufactured devices. Such techniques greatly enhance yield and performance in semiconductor production.

Career Highlights

Feng-Ju Chang is affiliated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leader in advanced semiconductor manufacturing. Throughout his career, Chang has been pivotal in pushing the boundaries of IC design and manufacturing processes, positioning himself as a key figure in the industry.

Collaborations

In his professional journey, Chang has collaborated with notable colleagues, including Hung-Chun Wang and Wen-Chun Huang. Together, they have explored innovative solutions that advance technologies in semiconductor fabrication, benefiting the broader research and development landscape.

Conclusion

With a robust portfolio of patents and a commitment to innovation, Feng-Ju Chang continues to influence the semiconductor industry significantly. His ongoing contributions not only enhance technological capabilities but also set new standards within the field of integrated circuit manufacturing. As technology evolves, Chang's work stands as a testament to the importance of creativity and collaboration in driving forward the future of electronics.

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