Company Filing History:

8 out of 131,324

Samsung Electronics Co., Ltd.

patents

1 out of 1,240

Sungkyunkwan University

patents

where one patent can have more than one assignee

Years Active: 2007-2023

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8 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11735427 - Polishing apparatus including polishing pad conditioner, non-contact displacement sensor, and data processor (2023-08-22),

2. 11222786 - Method of manufacture including polishing pad monitoring method and polishing apparatus including polishing pad monitoring device (2022-01-11),

3. 10340158 - Substrate cleaning apparatus (2019-07-02),

4. 9772296 - Method of inspecting a surface of a substrate and apparatus for performing the same (2017-09-26),

5. 8866636 - Method and apparatus for providing traffic information service using a mobile communication system (2014-10-21),

6. 7633288 - Method of testing semiconductor devices and handler used for testing semiconductor devices (2009-12-15),

7. 7408339 - Test system of semiconductor device having a handler remote control and method of operating the same (2008-08-05),

8. 7230417 - Test system of semiconductor device having a handler remote control and method of operating the same (2007-06-12),

Title: Eun-Seok Lee: Innovator in Polishing Technology

Introduction

Eun-Seok Lee is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of polishing technology, holding a total of 8 patents. His innovative work focuses on enhancing the efficiency and effectiveness of polishing processes.

Latest Patents

Eun-Seok Lee's latest patents include a polishing apparatus that features a polishing pad conditioner, a non-contact displacement sensor, and a data processor. In this method of manufacture, a displacement sensor is positioned over a conditioner disk. The conditioner disk is rotated to perform a conditioning process on the polishing surface of a polishing pad. During this conditioning process, the displacement sensor detects the displacement of the rotating conditioner disk. The height of the conditioner disk is then calculated based on the detected displacement. An endpoint of the conditioning process is determined on the polishing surface according to the calculated height. Another notable patent involves a method of manufacture that includes a polishing pad monitoring method and a polishing apparatus equipped with a polishing pad monitoring device, further showcasing his expertise in this area.

Career Highlights

Eun-Seok Lee has worked with notable organizations such as Samsung Electronics Co., Ltd. and Sungkyunkwan University. His experience in these esteemed institutions has allowed him to refine his skills and contribute to advancements in polishing technology.

Collaborations

Eun-Seok Lee has collaborated with several professionals in his field, including Ae-Yong Chung and Jeong-Ho Bang. These collaborations have fostered innovation and development in his projects.

Conclusion

Eun-Seok Lee's contributions to polishing technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in manufacturing processes.

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