The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2022

Filed:

May. 30, 2019
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Jin Shin, Hwaseong-si, KR;

Woo-Mok Son, Hwaseong-si, KR;

Nam-Hoon Lee, Hwaseong-si, KR;

Dong-Eog Kim, Suwon-si, KR;

Seung-Hun Oh, Osan-si, KR;

Eun-Seok Lee, Hwaseong-si, KR;

Young-Seok Jang, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/304 (2006.01); H01L 21/02 (2006.01); H01L 21/66 (2006.01); B24B 37/10 (2012.01); B24B 49/02 (2006.01); B24B 37/013 (2012.01); B24B 37/04 (2012.01); B24B 49/10 (2006.01);
U.S. Cl.
CPC ...
H01L 21/304 (2013.01); H01L 21/02013 (2013.01); H01L 22/12 (2013.01); B24B 37/013 (2013.01); B24B 37/042 (2013.01); B24B 37/10 (2013.01); B24B 49/02 (2013.01); B24B 49/10 (2013.01);
Abstract

In a method of manufacture, a displacement sensor is provided over a conditioner disk. The conditioner disk is rotated to perform a conditioning process on a polishing surface of a polishing pad. A displacement of the rotating conditioner disk is detected using the displacement sensor during the conditioning process. A height of the conditioner disk is calculated from the detected displacement. An end point of the conditioning process is determined on the polishing surface based on the calculated height.


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