The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2019

Filed:

Mar. 02, 2016
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Eun-Seok Lee, Hwaseong-si, KR;

Chang-Gil Ryu, Yongin-si, KR;

Geun-Young Song, Suwon-si, KR;

Jae-Chang Lee, Hwaseong-si, KR;

Yun-Seok Choi, Hwaseong-si, KR;

Jin-Suk Hong, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/10 (2006.01); B08B 1/04 (2006.01); B08B 3/02 (2006.01); B05B 1/20 (2006.01); B05B 13/04 (2006.01); B08B 1/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67046 (2013.01); B05B 1/20 (2013.01); B05B 13/0415 (2013.01); B08B 1/04 (2013.01); B08B 3/024 (2013.01); B08B 3/10 (2013.01); H01L 21/67051 (2013.01); H01L 21/67057 (2013.01); B08B 1/002 (2013.01);
Abstract

Provided is a substrate cleaning apparatus including: a cleaning bath configured to accommodate a substrate having a first surface and a second surface; a substrate support configured to support the substrate; first and second nozzle bars provided in the cleaning bath to be rotatable in a plane parallel with the substrate, each of the first and the second nozzle bars including a passage; a plurality of nozzles provided along a longitudinal direction of each of the first and the second nozzle bars and configured to spray the cleaning solution from the passage of each of the first and the second nozzle bars to the substrate; and first and second brushes, the first brush provided on a first side of the substrate and configured to clean the first surface and the second brush provided on a second side of the substrate and configured to clean the second surface of the substrate.


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