Suwon-si, South Korea

Eun Hyea Ko

USPTO Granted Patents = 1 

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):

Title: Eun Hyea KO: Innovator in Atomic Layer Etching Technology

Introduction

Eun Hyea KO is an accomplished inventor based in Suwon-si, South Korea. With a significant contribution to the field of semiconductor manufacturing, he holds a patent that showcases his innovative approach to etching methods. His work reflects a deep understanding of atomic layer processes and their applications in modern technology.

Latest Patents

Eun Hyea KO's prominent patent is titled "Atomic layer etching method and semiconductor device manufacturing method using the same." This patent details a sophisticated atomic layer etching method that allows for precise etching of a metal thin film from a substrate. This method includes the formation of a metal layer on a substrate and etching portions of this layer in an efficient and controlled manner. By utilizing active gas and etching support gas in a defined process, including an outlined formula for the etching support gas, KO's invention stands at the forefront of semiconductor production technologies.

Career Highlights

Throughout his career, Eun Hyea KO has gained substantial experience through his tenure at leading technology companies such as Samsung Electronics Co., Ltd. and DNF Co., Ltd. His involvement in these organizations has enabled him to refine his skills and contribute to groundbreaking research in semiconductor technologies.

Collaborations

Eun Hyea KO has collaborated with notable colleagues, including Hee Yeon Jeong and Jun Hee Cho. These partnerships underline his commitment to advancing innovations in the semiconductor sector and highlight the collaborative nature of research and development in this field.

Conclusion

Eun Hyea KO exemplifies the spirit of innovation within the semiconductor industry. His patented work on atomic layer etching methods not only reflects his technical expertise but also his dedication to enhancing manufacturing processes. As technology continues to evolve, KO's contributions will undoubtedly play a vital role in shaping the future of semiconductor device manufacturing.

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