The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Jun. 25, 2024
Samsung Electronics Co., Ltd., Suwon-si, KR;
Soyoung Lee, Suwon-si, KR;
Jeong-Do Oh, Wanju-gun, KR;
Eun Hyea Ko, Suwon-si, KR;
Ee-Seul Shin, Wanju-gun, KR;
Kwan-Hyun Park, Wanju-gun, KR;
Kang-Min Lee, Wanju-gun, KR;
Younjoung Cho, Suwon-si, KR;
Hoon Han, Suwon-si, KR;
Byungkeun Hwang, Suwon-si, KR;
Sunhye Hwang, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
An area-selective film forming method may include preparing a substrate having at least two areas made of different materials, forming a polyurea film on the at least two areas of the substrate, annealing the polyurea film and selectively removing the polyurea film on at least one area among the at least two areas, and forming a target film on the one area or a remaining area among the at least two areas. The one area may be an area from which the polyurea film is removed. The remaining area may be an area in which the polyurea film is not removed during the annealing the polyurea film and the selectively removing the polyurea film.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile