Eric Vella

Title: Eric Vella: Innovator in Optical Systems

Introduction

Eric Vella is a prominent inventor based in Mountain View, CA (US). He has made significant contributions to the field of optical systems, holding a total of 8 patents. His work focuses on improving the performance and accuracy of optical devices through innovative designs and methodologies.

Latest Patents

Among his latest patents, Vella has developed a system for correcting aberration and apodization in optical systems using correction plates. This optical system includes an illumination source, a detector, and collection optics designed to image a sample onto the detector. The system features multiple aberration correction plates that are strategically placed in pupil planes to provide partial correction of various linearly-independent aberration terms. Additionally, he has patented apparatus and methods for measuring the phase and amplitude of light through a layer. This invention utilizes an inspection or metrology system to direct an incident beam towards a photomask target, allowing for the determination of phase shift values based on intensity measurements.

Career Highlights

Eric Vella has worked with notable companies in the industry, including KLA-Tencor Technologies Corporation and KLA-Tencor Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in optical technology.

Collaborations

Throughout his career, Vella has collaborated with talented individuals such as Jamie Michael Sullivan and Ralph C. Wolf. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Eric Vella's contributions to optical systems through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in optical technology and improve the functionality of various optical devices.