The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2021
Filed:
Jan. 29, 2018
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Abdurrahman Sezginer, Monte Sereno, CA (US);
Kuljit Virk, Fremont, CA (US);
Eric Vella, Mountain View, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/41 (2006.01); G01N 21/956 (2006.01); G01J 1/44 (2006.01); G01J 9/00 (2006.01); G01N 21/55 (2014.01); G03F 1/84 (2012.01); G03F 1/32 (2012.01);
U.S. Cl.
CPC ...
G01N 21/41 (2013.01); G01J 1/44 (2013.01); G01J 9/00 (2013.01); G01N 21/55 (2013.01); G01N 21/95607 (2013.01); G03F 1/32 (2013.01); G03F 1/84 (2013.01); G01N 2021/95676 (2013.01);
Abstract
In one embodiment, disclosed are apparatus, methods, and targets for determining a phase shift of a photomask having a phase-shift target. An inspection or metrology system is used to direct an incident beam towards the target and then detect a plurality of intensity measurements that are transmitted through the target in response to the incident beam. A phase shift value for the target may then be determined based on the intensity measurements.