Haifa, Israel

Emanuel Gofman


Average Co-Inventor Count = 4.9

ph-index = 6

Forward Citations = 213(Granted Patents)


Location History:

  • Haifa, IL (1993 - 2010)
  • Haifa, IL (US) (2010)

Company Filing History:


Years Active: 1993-2010

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15 patents (USPTO):

Title: The Innovative Contributions of Emanuel Gofman

Introduction

Emanuel Gofman is a prominent inventor based in Haifa, Israel. He has made significant contributions to the field of optical proximity correction, holding a total of 15 patents. His work has advanced the methodologies used in model-based optical proximity correction, showcasing his expertise and innovative spirit.

Latest Patents

Gofman's latest patents include groundbreaking methods for simultaneous computation of multiple points on one or multiple cut lines. This involves creating a region of interest (ROI) with an interaction distance and locating polygons within the ROI. His innovative approach generates cut lines of sample points that represent a set of vertices, allowing for the determination of angular positions and the generation of new ROIs to correct for optical proximity. Another notable patent focuses on performance in model-based optical proximity correction using an efficient polygon pinning method. This method involves computing a first polygon with vertices representative of located points of interest and determining their spatial relation to the ROI. The vertices are then pinned to the boundaries within the ROI, forming a second polygon that is used to correct for optical proximity.

Career Highlights

Emanuel Gofman is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of innovation in his field. His work has not only contributed to the advancement of technology but has also positioned him as a key figure in optical proximity correction methodologies.

Collaborations

Gofman has collaborated with notable colleagues, including Mark Alan Lavin and Dov Ramm. These partnerships have further enriched his work and contributed to the success of his innovative projects.

Conclusion

Emanuel Gofman's contributions to the field of optical proximity correction are significant and impactful. His innovative patents and collaborations reflect his dedication to advancing technology and improving methodologies in his area of expertise.

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