The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2006
Filed:
Oct. 27, 2003
Gregg M. Gallatin, Newtown, CT (US);
Emanuel Gofman, Haifa, IL;
Kafai Lai, Poughkeepsie, NY (US);
Mark A. Lavin, Katonah, NY (US);
Maharaj Mukherjee, Wappingers Falls, NY (US);
Dov Ramm, Menashe, IL;
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Shlomo Shlafman, Haifa, IL;
Gregg M. Gallatin, Newtown, CT (US);
Emanuel Gofman, Haifa, IL;
Kafai Lai, Poughkeepsie, NY (US);
Mark A. Lavin, Katonah, NY (US);
Maharaj Mukherjee, Wappingers Falls, NY (US);
Dov Ramm, Menashe, IL;
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Shlomo Shlafman, Haifa, IL;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for calculating long-range image contributions from mask polygons. An algorithm is introduced having application to Optical Proximity Correction in optical lithography. A finite integral for each sector of a polygon replaces an infinite integral. Integrating over two triangles, rather than integrating on the full sector, achieves a finite integral. An analytical approach is presented for a power law kernel to reduce the numerical integration of a sector to an analytical expression evaluation. The mask polygon is divided into regions to calculate interaction effects, such as intermediate-range and long-range effects, by truncating the mask instead of truncating the kernel function.