The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2006
Filed:
Dec. 16, 2003
Gregg M. Gallatin, Newton, CT (US);
Emanuel Gofman, Haifa, IL;
Kafai Lai, Poughkeepsie, NY (US);
Mark A. Lavin, Katonah, NY (US);
Maharaj Mukherjee, Wappingers Falls, NY (US);
Dov Ramm, Menashe, IL;
Alan Edward Rosenbluth, Yorktown Heights, NY (US);
Shlomo Shlafman, Haifa, IL;
Gregg M. Gallatin, Newton, CT (US);
Emanuel Gofman, Haifa, IL;
Kafai Lai, Poughkeepsie, NY (US);
Mark A. Lavin, Katonah, NY (US);
Maharaj Mukherjee, Wappingers Falls, NY (US);
Dov Ramm, Menashe, IL;
Alan Edward Rosenbluth, Yorktown Heights, NY (US);
Shlomo Shlafman, Haifa, IL;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method is provided for optimizing the number of kernels N used in a sum of coherent sources (SOCS) for optical proximity correction in an optical microlithography process, including setting the number of kernels N to a predetermined minimum value Nmin, where a determination is made as to whether an accuracy estimate of calculated intensity is within a tolerable value, and a determination is also made as to whether an added X/Y asymmetry estimate of the calculated intensity is negligible.