The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2006
Filed:
May. 13, 2004
Gregg M. Gallatin, Newtown, CT (US);
Emanuel Gofman, Haifa, IL;
Kafai Lai, Poughkeepsie, NY (US);
Mark A. Lavin, Katonah, NY (US);
Dov Ramm, Menashe, IL;
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Shlomo Shlafman, Haifa, IL;
Zheng Chen, Poughkeepsie, NY (US);
Maharaj Mukherjee, Wappingers Falls, NY (US);
Gregg M. Gallatin, Newtown, CT (US);
Emanuel Gofman, Haifa, IL;
Kafai Lai, Poughkeepsie, NY (US);
Mark A. Lavin, Katonah, NY (US);
Dov Ramm, Menashe, IL;
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Shlomo Shlafman, Haifa, IL;
Zheng Chen, Poughkeepsie, NY (US);
Maharaj Mukherjee, Wappingers Falls, NY (US);
International Business Machines Coporation, Armonk, NY (US);
Abstract
A method is described for performing model-based optical proximity corrections on a mask layout used in an optical lithography process having a plurality of mask shapes. Model-based optical proximity correction is performed by computing the image intensity on selected evaluation points on the mask layout. The image intensity to be computed includes optical flare and stray light effects due to the interactions between the shapes on the mask layout. The computation of the image intensity involves sub-dividing the mask layout into a plurality of regions, each region at an increasing distance from the evaluation point. The contributions of the optical flare and stray light effects due to mask shapes in each of the regions are then determined. Finally, all the contributions thus obtained are combined to obtain the final computation of the image intensity at the selected point.