International Business Machines Corporation

Emanuel Gofman

Mark Alan Lavin

Dov Ramm

Maharaj Mukherjee

Alan Edward Rosenbluth

Kafai Lai

Shlomo Shlafman

Gregg M Gallatin

Ehud Dov Karnin

Moshe Leibowitz

Raanan Gewirtzman

Zheng G Chen

Ayal Bar-David

Franklin Gracer

Aharon Aharon

Eilon Barnea

Victor Shwartzburd

Ilan Be'er

Methods, and program storage devices, for performing model-based optical proximity correction by providing a region of interest (ROI) having an interaction distance and locating at least one polygon within the ROI. A cut line of sample points representative of a set of vertices, or plurality of cut lines, are generated within the ROI across at least one lateral edge of the polygon(s). An angular position, and first and second portions of the cut line residing on opposing sides of an intersection between the cut line and the lateral edge of the polygon are determined, followed by generating a new ROI by extending the original ROI beyond its interaction distance based on such angular position, and first and second portions of the cut line. In this manner, a variety of new ROIs may be generated, in a variety of different directions, to ultimately correct for optical proximity.

Simultaneous computation of multiple points on one or multiple cut lines

Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.

Performance in model-based OPC engine utilizing efficient polygon pinning method

A method for preparing peptide spectra for identification, the method including constructing a symmetric distance matrix from a plurality of peptide spectra, where a cluster of at least one of the spectra is represented in a row of the matrix, and where the cluster is also represented in a column of the matrix, finding the minimum of each of the clusters in the matrix, constructing a vector from the minima where each element in the vector corresponds to one of the clusters, finding the global minimum of the matrix as being the minimum of the vector, merging two of the clusters identified by the global minimum into a merged cluster, and providing the merged cluster for identification of at least one peptide associated with the merged cluster.

Preparing peptide spectra for identification

Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired design data hierarchy. A density map is then generated corresponding to interactions between the polygons and plurality of cells, and then the densities within each cell are convolved. An interaction map is formed using the convolved densities, followed by truncating the interaction map to form a map of truncated cells. Substantially identical groupings of the truncated cells are then segregated respectively into differing ones of a plurality of buckets, whereby each of these buckets comprise a single set of identical groupings of truncated cells. A hierarchical arrangement is generated using these buckets, and the desired design data hierarchy enforced using the hierarchical arrangement to ultimately correct for optical lithography.

Renesting interaction map into design for efficient long range calculations

A first method to compute a phase map within an optical proximity correction simulation kernel utilizes simulated wavefront information from randomly generated data. A second method uses measured data from optical tools. A phase map is created by analytically embedding a randomly generated two-dimensional array of complex numbers of wavefront information, and performing an inverse Fourier Transform on the resultant array. A filtering function requires the amplitude of each element of the array to be multiplied by a Gaussian function. A power law is then applied to the array. The elements of the array are shuffled, and converted from the phasor form to real/imaginary form. A two-dimensional Fast Fourier Transform is applied. The array is then unshuffled, and converted back to phasor form.

Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare

A method is described for performing model-based optical proximity corrections on a mask layout used in an optical lithography process having a plurality of mask shapes. Model-based optical proximity correction is performed by computing the image intensity on selected evaluation points on the mask layout. The image intensity to be computed includes optical flare and stray light effects due to the interactions between the shapes on the mask layout. The computation of the image intensity involves sub-dividing the mask layout into a plurality of regions, each region at an increasing distance from the evaluation point. The contributions of the optical flare and stray light effects due to mask shapes in each of the regions are then determined. Finally, all the contributions thus obtained are combined to obtain the final computation of the image intensity at the selected point.

Fast and accurate optical proximity correction engine for incorporating long range flare effects

A method is provided for optimizing the number of kernels N used in a sum of coherent sources (SOCS) for optical proximity correction in an optical microlithography process, including setting the number of kernels N to a predetermined minimum value Nmin, where a determination is made as to whether an accuracy estimate of calculated intensity is within a tolerable value, and a determination is also made as to whether an added X/Y asymmetry estimate of the calculated intensity is negligible.

Method for optimizing a number of kernels used in a sum of coherent sources for optical proximity correction in an optical microlithography process

Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired design data hierarchy. A density map is then generated corresponding to interactions between the polygons and plurality of cells, and then the densities within each cell are convolved. An interaction map is formed using the convolved densities, followed by truncating the interaction map to form a map of truncated cells. Substantially identical groupings of the truncated cells are then segregated respectively into differing ones of a plurality of buckets, whereby each of these buckets comprise a single set of identical groupings of truncated cells. A hierarchal arrangement is generated using these buckets, and the desired design data hierarchy enforced using the hierarchal arrangement to ultimately correct for optical lithography.

A method for calculating long-range image contributions from mask polygons. An algorithm is introduced having application to Optical Proximity Correction in optical lithography. A finite integral for each sector of a polygon replaces an infinite integral. Integrating over two triangles, rather than integrating on the full sector, achieves a finite integral. An analytical approach is presented for a power law kernel to reduce the numerical integration of a sector to an analytical expression evaluation. The mask polygon is divided into regions to calculate interaction effects, such as intermediate-range and long-range effects, by truncating the mask instead of truncating the kernel function.

Extending the range of lithographic simulation integrals

A method for calculating density maps in hierarchical designs includes the steps of deoverlapping objects in the design, providing an area of interest in the design, generating a grid in the area of interest to partition the area of interest into grid elements, determining whether the local properties of each object within the grid elements have been previously calculated, if previously calculated, adding the previously calculated value for the local properties to a corresponding grid element, otherwise, calculating the local properties of the object and summing the local properties of the objects for each associated grid element such that the local properties are calculated only once for a given object throughout the design. A system is also includes for implementing the method.

System and method for determining density maps in hierarchical designs

A pseudo random number generator is provided which generates the next number in a pseudo-random sequence of numbers from a binary representation of an input number and a primitive root of a prime number P, where P has the form 2m-1, m being an integer. The binary representations of the current random number and the primitive root are multiplied to form a binary product. The binary number represented by bits 0 to m-1 of the product are added to the binary number represented by bits m to 2m-1 of the product to form a sum. The contents of bit m of the sum are then added to the sum, via the carry-in input of the adder. The next binary number in the sequence is represented by bits 0 to m-1 of the sum with the contents of bit m thereof so added. Particular applications include data processors having an imbedded multiply-add unit with reconfiguration resources to implement the invention.

Random number generator

In the dynamic process for the generation of biased pseudo-random test patterns for the functional verification of integrated circuit designs, the verification is performed in a sequence of steps, with each test pattern providing all data required to test a circuit design during at least one of said steps. Generation of each step is performed in two stages, where in a first stage all facilities and parameters required for the execution of the respective step are defined and assigned the proper values, and where in a second stage the execution of the particular step is performed. This process is continued until a test pattern with the number of steps requested by the user is generated, so that finally the test pattern comprises three parts: The initialized facilities define the initial machine state and execution parts of the test pattern, and the values of the facilities which have been changed during the execution of the steps, form the results part of the test pattern.

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Haifa, Israel

Emanuel Gofman