The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Jun. 01, 2007
Gregg M Gallatin, Newtown, CT (US);
Emanuel Gofman, Haifa, IL;
Kafai Lai, Poughkeepsie, NY (US);
Mark A. Lavin, Katonah, NY (US);
Maharaj Mukherjee, Wappingers Falls, NY (US);
Dov Ramm, Menashe, IL;
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Shlomo Shlafman, Haifa, IL;
Gregg M Gallatin, Newtown, CT (US);
Emanuel Gofman, Haifa, IL;
Kafai Lai, Poughkeepsie, NY (US);
Mark A. Lavin, Katonah, NY (US);
Maharaj Mukherjee, Wappingers Falls, NY (US);
Dov Ramm, Menashe, IL;
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Shlomo Shlafman, Haifa, IL;
International Business Machines Corporation, Armonk, NY (US);
Abstract
Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.