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For the Inventor, By the Inventor

San Jose, CA, United States of America

Ekaterina A Mikhaylichenko

USPTO Granted Patents = 14 

Average Co-Inventor Count = 4.6

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:

goldMedal14 out of 13,726 
 
Applied Materials, Inc.
 patents

Years Active: 2018-2025

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14 patents (USPTO):Explore Patents
1. 12198944 - Substrate handling in a modular polishing system with single substrate cleaning chambers (2025-01-14),
2. 12194591 - Roller for location-specific wafer polishing (2025-01-14),
3. 12051599 - Cleaning method with in-line SPM processing (2024-07-30),
4. 12027382 - Surface cleaning with directed high pressure chemistry (2024-07-02),
5. 11942319 - Pad carrier for horizontal pre-clean module (2024-03-26),
6. 11819976 - Spray system for slurry reduction during chemical mechanical polishing (cmp) (2023-11-21),
7. 11764069 - Asymmetry correction via variable relative velocity of a wafer (2023-09-19),
8. 11721563 - Non-contact clean module (2023-08-08),
9. 11682567 - Cleaning system with in-line SPM processing (2023-06-20),
10. 11289347 - Non-contact clean module (2022-03-29),
11. 10786885 - Thin plastic polishing article for CMP applications (2020-09-29),
12. 10751738 - Spray bar design for uniform liquid flow distribution on a substrate (2020-08-25),
13. 9984867 - Systems and methods for rinsing and drying substrates (2018-05-29),
14. 9859135 - Substrate rinsing systems and methods (2018-01-02),

Title: Innovator Spotlight: Ekaterina A. Mikhaylichenko

Introduction

Ekaterina A. Mikhaylichenko is a prominent inventor based in San Jose, CA, with a remarkable portfolio of 14 patents. Her work primarily centers around advancements in chemical mechanical polishing (CMP) systems, which are essential in semiconductor manufacturing. With her innovative contributions, she has significantly influenced the efficiency and effectiveness of substrate handling in the industry.

Latest Patents

Among her latest patents, Mikhaylichenko has developed a system for substrate handling in modular polishing systems with single substrate cleaning chambers. This invention focuses on improving the functionality of chemical mechanical polishing systems, particularly in the realm of semiconductor device manufacturing. In this system, a polishing apparatus integrates a substrate cleaning module that enhances the transfer of substrates, streamlining the overall cleaning and polishing process.

Another noteworthy patent includes a roller for location-specific wafer polishing. This technology features a unique polishing apparatus designed to hold a substrate in a precise plane, utilizing a rotary drum to ensure effective contact between the polishing pad and the substrate. The integration of actuators allows for fine-tuning the polishing process, further refining the capabilities of semiconductor fabrication.

Career Highlights

Ekaterina currently works at Applied Materials, Inc., a leading global provider of equipment, services, and software for the manufacturing of semiconductor devices. Her role involves pioneering research and development efforts that not only address current challenges but also anticipate future industry needs.

Collaborations

Throughout her career, Mikhaylichenko has collaborated with esteemed colleagues such as Brian J. Brown and Jagan Rangarajan. Together, they have pushed the boundaries of innovation in substrate handling and polishing technologies, sharing their expertise to bring about groundbreaking solutions in the semiconductor sector.

Conclusion

Ekaterina A. Mikhaylichenko stands out as an influential figure in the field of semiconductor manufacturing. Her 14 patents reflect her commitment to innovation and her significant contributions to the advancement of CMP systems. As technology continues to evolve, Mikhaylichenko's work will undoubtedly play a critical role in shaping the future of the industry.

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