The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2023

Filed:

Jun. 11, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Brian J. Brown, Palo Alto, CA (US);

Ekaterina A. Mikhaylichenko, San Jose, CA (US);

Brian K. Kirkpatrick, Allen, TX (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/08 (2006.01); B08B 1/00 (2006.01); B08B 3/12 (2006.01); H01L 21/687 (2006.01); B08B 1/04 (2006.01); B08B 13/00 (2006.01); B08B 7/04 (2006.01); B65G 47/90 (2006.01); B08B 3/02 (2006.01); B08B 3/04 (2006.01); B08B 3/14 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67057 (2013.01); B08B 1/002 (2013.01); B08B 1/04 (2013.01); B08B 3/02 (2013.01); B08B 3/022 (2013.01); B08B 3/041 (2013.01); B08B 3/08 (2013.01); B08B 3/12 (2013.01); B08B 3/14 (2013.01); B08B 7/04 (2013.01); B08B 13/00 (2013.01); B65G 47/90 (2013.01); H01L 21/67051 (2013.01); H01L 21/68707 (2013.01); B08B 2203/007 (2013.01); H01L 21/02074 (2013.01);
Abstract

A cleaning system for processing a substrate after polishing includes a sulfuric peroxide mix (SPM) module, at least two cleaning elements, and a plurality of robots. The SPM module includes a sulfuric peroxide mix (SPM) cleaner having a first container to hold a sulfuric peroxide mix liquid and five to twenty first supports to hold five to twenty substrates in the liquid in the first container, and a rinsing station having a second container to hold a rinsing liquid and five to twenty second supports to hold five to twenty substrates in the liquid in the second container. Each of the at least two cleaning elements are configured to process a single substrate at a time. Examples of a cleaning element include a megasonic cleaner, a rotating brush cleaner, a buff pad cleaner, a jet spray cleaner, a chemical spin cleaner, a spin drier, and a marangoni drier.


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