Location History:
- Mechanicsville, NY (US) (2019)
- Mechanicville, NY (US) (2017 - 2023)
Company Filing History:
Years Active: 2017-2023
Title: Dongsuk Park: Innovator in Interference Pattern Measurement
Introduction
Dongsuk Park is a notable inventor based in Mechanicville, NY (US). He holds a total of 8 patents, showcasing his significant contributions to the field of measurement technology. His work primarily focuses on self-referencing and self-calibrating interference pattern overlay measurement.
Latest Patents
One of Dongsuk Park's latest patents involves a sophisticated method for measuring misalignment in interference patterns. This innovation utilizes two pairs of alignment targets, where one is aligned and the other is misaligned by a bias distance. These targets are formed on different masks to create a first pair of conjugated interference patterns. Additional pairs of alignment targets are also created to produce a second pair of conjugated interference patterns that are inverted compared to the first. The misalignment of the dark and light regions in both pairs is determined when the patterns are overlaid. A magnification factor is calculated as a ratio of the difference in misalignment of the dark and light regions over twice the bias distance. The interference pattern misalignment is then divided by this magnification factor to yield a self-referenced and self-calibrated target misalignment amount, which is subsequently output.
Career Highlights
Dongsuk Park has made significant strides in his career, working with prominent companies such as GlobalFoundries Inc. and Kla Corporation. His expertise in measurement technology has been instrumental in advancing the capabilities of these organizations.
Collaborations
Throughout his career, Dongsuk Park has collaborated with talented individuals, including Dongyue Yang and Xintuo Dai. These partnerships have contributed to the development of innovative solutions in the field.
Conclusion
Dongsuk Park's contributions to interference pattern measurement technology highlight his role as a leading inventor in this domain. His innovative patents and collaborations reflect his commitment to advancing measurement techniques.
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