The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2017
Filed:
Mar. 01, 2016
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Dongsuk Park, Mechanicville, NY (US);
Yue Zhou, Clifton Park, NY (US);
Mert Karakoy, Malta, NY (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01J 37/28 (2006.01); G01B 15/00 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); G01B 15/00 (2013.01); H01J 37/28 (2013.01);
Abstract
Methodologies for using dummy patterns for overlay target design and overlay control are provided. Embodiments include providing a first dummy pattern on a first layer as an outer overlay target for an integrated circuit (IC); providing a pattern associated with a second dummy pattern on a second layer as a target for measuring overlay; and utilizing a scanning electron microscope (SEM) to obtain an overlay measurement between the first and second dummy patterns.