Mert Karakoy

Title: Mert Karakoy: Innovator in Semiconductor Structures

Introduction

Mert Karakoy is a notable inventor based in Malta, NY (US), recognized for his contributions to the field of semiconductor technology. With a total of 2 patents, he has made significant strides in the design and manufacturing of overlay structures.

Latest Patents

Karakoy's latest patents include innovative methodologies that enhance the precision of semiconductor manufacturing. One of his patents focuses on overlay structures, detailing a method that involves locating a first plurality of offset dummy features in a first layer and a second plurality in a second layer. This method measures the distance between these features to determine any shifts between the layers. Another patent outlines a method for using dummy patterns for overlay target design and control, which includes providing a first dummy pattern on a first layer as an outer overlay target for integrated circuits and utilizing a scanning electron microscope (SEM) for overlay measurements.

Career Highlights

Mert Karakoy is currently employed at GlobalFoundries Inc., a leading semiconductor manufacturer. His work at the company has positioned him as a key player in advancing semiconductor technologies.

Collaborations

Karakoy collaborates with talented professionals in his field, including Dongsuk Park and Yue Zhou. Their combined expertise contributes to the innovative projects at GlobalFoundries Inc.

Conclusion

Mert Karakoy's work in semiconductor structures and his innovative patents reflect his commitment to advancing technology in the industry. His contributions are paving the way for future developments in semiconductor manufacturing.