The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2019

Filed:

Jan. 03, 2018
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Xintuo Dai, Rexford, NY (US);

Dongsuk Park, Mechanicsville, NY (US);

Guoxiang Ning, Clifton Park, NY (US);

Mert Karakoy, Malta, NY (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/544 (2006.01); H01L 21/66 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H01L 23/544 (2013.01); G03F 7/70633 (2013.01); H01L 22/12 (2013.01); H01L 2223/54426 (2013.01); H01L 2223/54466 (2013.01);
Abstract

The present disclosure generally relates to semiconductor structures and, more particularly, to overlay structures and methods of manufacture. The method includes locating a first plurality of offset dummy features in a first layer; locating a second plurality of offset dummy features in a second layer; measuring a distance between the first plurality of offset dummy features and the second plurality of offset dummy features; and determining that the first layer or the second layer is shifted with respect to one another based on the measurement.


Find Patent Forward Citations

Loading…