The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2020

Filed:

Mar. 11, 2019
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Hongliang Shen, Ballston Lake, NY (US);

Guoxiang Ning, Clifton Park, NY (US);

Erfeng Ding, Clifton Park, NY (US);

Dongsuk Park, Mechanicville, NY (US);

Xiaoxiao Zhang, Clifton Park, NY (US);

Lan Yang, Ballston Lake, NY (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01L 27/02 (2006.01); H01L 27/088 (2006.01); G06F 30/20 (2020.01); G06F 30/398 (2020.01); G06F 111/04 (2020.01); G06F 111/20 (2020.01);
U.S. Cl.
CPC ...
H01L 22/32 (2013.01); G06F 30/20 (2020.01); G06F 30/398 (2020.01); H01L 27/0207 (2013.01); H01L 27/0886 (2013.01); G06F 2111/04 (2020.01); G06F 2111/20 (2020.01);
Abstract

The present disclosure relates to a method which includes generating a device layout of an eBeam based overlay (EBO OVL) structure with a minimum design rule, simulating a worst case process margin for the generated device layout of the EBO OVL structure, enabling a plurality of devices for the simulated worst case process margin for the generated device layout of the EBO OVL structure, and breaking a plurality of design rules for the enabled plurality of devices of the EBO OVL structure to generate an OVL measurement layout of the EBO OVL structure.


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