Dong-Suk Shin

This inventor holds 100 USPTO granted patents and 10 published patent applications and 1 EPO patent, primarily in Semiconductor Devices (CPC class H01L29-66545). Top assignees: Samsung Electronics Co., Ltd., Hynix Semiconductor Inc., Skhynix Inc.. Active years: 2007-2026.

USPTO Granted Patents = 100 (Patent Applications = 10)

% Patents Active = 77.0

EPO Patents = 1

Average Co-Inventor Count = 3.0

ph-index = 10

Forward Citations = 731(Granted Patents)

Forward Citations (Not Self Cited) = 693(Dec 10, 2025)

Inventors with similar research interests:

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Location History:

SuWon, KR (2008)
Kyoungki-do, KR (2008 - 2009)
Suwon-si, KR (2009 - 2010)
Ichon, KR (2010 - 2011)
Seoul, KR (2016)
Gyeonggi-do, KR (2009 - 2017)
Yongin-si, KR (2007 - 2023)

Company Filing History:

83 out of 132,108

Samsung Electronics Co., Ltd.

patents

13 out of 6,228

Hynix Semiconductor Inc.

Korea University Industrial Academic Collaboration Foundation

patents

5. 1 out of 6,034

Samsung Electronics Ltd.

patents

where one patent can have more than one assignee

Years Active: 2007-2026

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Areas of Expertise:

Semiconductor Devices

FinFETs

Multi-Gate Transistors

Manufacturing Methods

Strain-Inducing Patterns

Source/Drain Configurations

Thermal Management

Layer Configurations

Integrated Circuits

Stressor Techniques

100 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12581634 - Semiconductor devices incorporating semiconductor layer configurations and methods of manufacturing the same (2026-03-17),

2. 12225741 - Semiconductor device including source/drain having sidewalls with convex and concave portions (2025-02-11),

3. 11784255 - Semiconductor devices with bent portions (2023-10-10),

4. 11728345 - Multi-gate metal-oxide-semiconductor field effect transistor (2023-08-15),

5. 11469237 - Semiconductor devices with layers commonly contacting fins and methods of manufacturing the same (2022-10-11),

6. 11367620 - Method of fabricating semiconductor device (2022-06-21),

7. 11069685 - Semiconductor device (2021-07-20),

8. 11037926 - Semiconductor device (2021-06-15),

9. 10796919 - Method of fabricating semiconductor device (2020-10-06),

10. 10790361 - Semiconductor device having a fin structure and a manufacturing method thereof (2020-09-29),

11. 10411011 - Semiconductor devices and methods of manufacturing the same (2019-09-10),

12. 10361202 - Multigate metal-oxide semiconductor field effect transistor (2019-07-23),

13. 10304932 - Semiconductor device having a fin structure and a manufacturing method thereof (2019-05-28),

14. 10297601 - Semiconductor devices with layers commonly contacting fins and methods of manufacturing the same (2019-05-21),

15. 10043806 - Semiconductor devices and methods of manufacturing the same (2018-08-07),

Title: The Innovative Journey of Dong-Suk Shin

Introduction: Dong-Suk Shin, a talented inventor hailing from Yongin-si, South Korea, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Dong-Suk Shin's latest patents include cutting-edge technologies in the fields of artificial intelligence, renewable energy, and biotechnology, showcasing his versatility and forward-thinking approach to innovation.

Career Highlights: With a career spanning over two decades, Dong-Suk Shin has established himself as a pioneer in the tech industry, holding numerous patents that have revolutionized various sectors. His innovative solutions have garnered international recognition and praise.

Collaborations: Throughout his career, Dong-Suk Shin has collaborated with leading research institutions, universities, and tech companies to further develop and implement his inventions. His ability to work in multidisciplinary teams has led to the successful commercialization of several groundbreaking technologies.

Conclusion: Dong-Suk Shin's passion for innovation, coupled with his dedication to pushing the boundaries of technology, has solidified his position as a respected inventor in the global tech community. His relentless pursuit of excellence continues to inspire future generations of inventors and innovators.