Dong Hun Kang

Title: The Innovative Contributions of Dong Hun Kang

Introduction

Dong Hun Kang is a prominent inventor based in Uiwang-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP) with a focus on copper films and organic films. With a total of 7 patents to his name, Kang's work has had a substantial impact on the semiconductor industry.

Latest Patents

Kang's latest patents include a CMP slurry composition for copper films and a method of polishing copper films using the same. This composition features a polar solvent or a non-polar solvent, along with polishing particles modified with a silicon-containing compound. Another notable patent is the organic film CMP slurry composition, which is designed for polishing organic films. This composition includes either a polar or non-polar solvent and a metal oxide abrasive, is acidic, and has a carbon content of around 50 to 95 atm %.

Career Highlights

Throughout his career, Dong Hun Kang has worked with leading companies in the technology sector. He has been associated with Samsung SDI Co., Inc. and Samsung Electro-Mechanics Co., Ltd., where he has contributed to various innovative projects and advancements in materials science.

Collaborations

Kang has collaborated with notable colleagues in his field, including Tae Wan Kim and Jong Il Noh. These partnerships have fostered a collaborative environment that encourages innovation and the development of new technologies.

Conclusion

Dong Hun Kang's contributions to the field of CMP and his innovative patents highlight his expertise and dedication to advancing technology. His work continues to influence the semiconductor industry and pave the way for future innovations.