The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2020
Filed:
Aug. 10, 2018
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, KR;
Inventors:
Jung Min Choi, Uiwang-si, KR;
Haruki Nojo, Uiwang-si, KR;
Yong Soon Park, Uiwang-si, KR;
Yong Sik Yoo, Uiwang-si, KR;
Dong Hun Kang, Uiwang-si, KR;
Go Un Kim, Uiwang-si, KR;
Tae Wan Kim, Uiwang-si, KR;
Assignee:
Samsung SDI Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09G 1/06 (2006.01); C09G 1/00 (2006.01); C09K 3/14 (2006.01); C09K 13/06 (2006.01); C09G 1/04 (2006.01); B24B 37/04 (2012.01); H01L 21/321 (2006.01); H01L 21/3105 (2006.01); B24B 1/00 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 1/00 (2013.01); B24B 37/044 (2013.01); C09G 1/00 (2013.01); C09G 1/04 (2013.01); C09G 1/06 (2013.01); C09K 3/1454 (2013.01); C09K 3/1463 (2013.01); C09K 3/1472 (2013.01); C09K 13/06 (2013.01); H01L 21/30625 (2013.01); H01L 21/31058 (2013.01); H01L 21/3212 (2013.01);
Abstract
The present invention relates to an organic film CMP slurry composition for polishing an organic film, which includes at least either of a polar solvent or a non-polar solvent and a metal oxide abrasive, is acidic, and has a carbon content of around 50 to 95 atm %, and a polishing method using the same.