This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Sdi Co., Inc.. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Haruki Nojo - Innovator in Organic Film CMP Slurry Composition
Introduction
Haruki Nojo is a notable inventor based in Uiwang, South Korea. He has made significant contributions to the field of materials science, particularly in the development of innovative compositions for polishing organic films.
Latest Patents
Haruki Nojo holds a patent for an "Organic film CMP slurry composition and polishing method using same." This invention relates to a specialized CMP slurry composition designed for polishing organic films. The composition includes at least one of a polar solvent or a non-polar solvent, along with a metal oxide abrasive. It is characterized by its acidic nature and a carbon content of around 50 to 95 atm %.
Career Highlights
Haruki Nojo is currently employed at Samsung SDI Co., Inc., where he continues to work on advancements in material compositions and polishing methods. His expertise in this area has positioned him as a valuable asset to the company.
Collaborations
Some of his coworkers include Yong Soon Park and Tae Wan Kim, who collaborate with him on various projects within the company.
Conclusion
Haruki Nojo's innovative work in the field of organic film CMP slurry compositions showcases his dedication to advancing technology in materials science. His contributions are significant in enhancing the efficiency of polishing methods used in various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile