Company Filing History:
Years Active: 2025
Title: The Innovative Mind of Deepyanti Taneja
Introduction
Deepyanti Taneja is a notable inventor based in Happy Valley, Oregon. He has made significant contributions to the field of integrated circuits, showcasing his expertise through his innovative patents. His work is recognized within the industry, particularly at Intel Corporation, where he applies his knowledge and skills.
Latest Patents
Deepyanti Taneja holds a patent for "Hybrid etch stop layers." This invention involves an integrated circuit that includes a first layer and a second layer positioned above the first layer. A third layer is situated between a first section of the first layer and a first section of the second layer. Additionally, a fourth layer is laterally adjacent to the third layer, positioned between a second section of the first layer and a second section of the second layer. Notably, the first dielectric material of the third layer differs from the second dielectric material of the fourth layer, either compositionally or structurally. In this design, the third and fourth layers serve as etch stop layers, which can be coplanar with respect to their top surfaces, bottom surfaces, or both.
Career Highlights
Deepyanti Taneja's career at Intel Corporation has been marked by his dedication to advancing technology in integrated circuits. His innovative approach has led to the development of unique solutions that enhance the performance and efficiency of electronic devices. His patent reflects his commitment to pushing the boundaries of what is possible in the field.
Collaborations
Throughout his career, Deepyanti has collaborated with talented individuals such as Travis W LaJoie and Abhishek Anil Sharma. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Deepyanti Taneja is a remarkable inventor whose contributions to integrated circuits have made a lasting impact on the industry. His innovative patent for hybrid etch stop layers exemplifies his expertise and commitment to advancing technology.