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Daniel Lee Diehl

This inventor holds 26 USPTO granted patents and 5 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2015-2024.

USPTO Granted Patents = 26 (Patent Applications = 5)

% Patents Active = 96.2

Average Co-Inventor Count = 6.4

ph-index = 4

Forward Citations = 61(Granted Patents)

Location History:

Mihama-ku Chiba, JP (2020 - 2023)
Chba, JP (2023)
Chiba, JP (2015 - 2024)

Company Filing History:

26 out of 14,403

Applied Materials, Inc.

Years Active: 2015-2024

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26 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12125728 - Substrate carrier (2024-10-22),

2. 11994800 - Dose reduction of patterned metal oxide photoresists (2024-05-28),

3. 11802349 - Method for depositing high quality PVD films (2023-10-31),

4. 11778926 - Method and apparatus for deposition of multilayer device with superconductive film (2023-10-03),

5. 11739418 - Method and apparatus for deposition of metal nitrides (2023-08-29),

6. 11575071 - Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and electronic devices (2023-02-07),

7. 11550222 - Dose reduction of patterned metal oxide photoresists (2023-01-10),

8. 11495461 - Film stack for lithography applications (2022-11-08),

9. 11437559 - Method and apparatus for deposition of multilayer device with superconductive film (2022-09-06),

10. 11313034 - Methods for depositing amorphous silicon layers or silicon oxycarbide layers via physical vapor deposition (2022-04-26),

11. 11081623 - Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices (2021-08-03),

12. 11056277 - Magnetized substrate carrier apparatus with shadow mask for deposition (2021-07-06),

13. 10886155 - Optical stack deposition and on-board metrology (2021-01-05),

14. D904640 - Substrate carrier (2020-12-08),

15. 10546973 - Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices (2020-01-28),

Title: Daniel Lee Diehl - Innovative Inventor from Chiba, JP

Introduction: Daniel Lee Diehl is a renowned inventor based in Chiba, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Daniel Lee Diehl holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach.

Career Highlights: With over two decades of experience in the innovation industry, Daniel Lee Diehl has worked with leading research institutions and companies to develop cutting-edge solutions that have revolutionized the way we approach modern challenges.

Collaborations: Throughout his career, Daniel Lee Diehl has collaborated with top engineers, scientists, and inventors from around the world, fostering a culture of creativity and excellence in all his projects.

Conclusion: Daniel Lee Diehl's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

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