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For the Inventor, By the Inventor

Chiba, Japan

Daniel Lee Diehl

This inventor holds 26 USPTO granted patents and 5 published patent applications, primarily in Physical Vapor Deposition. Top assignee: Applied Materials, Inc.. Active years: 2015-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel Lee Diehl. Retrieved from https://idiyas.com/inventor/daniel-lee-diehl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26 

% Patents Active = 96.2

Average Co-Inventor Count = 6.4

ph-index = 4

Forward Citations = 61(Granted Patents)


Location History:

  • Mihama-ku Chiba, JP (2020 - 2023)
  • Chba, JP (2023)
  • Chiba, JP (2015 - 2024)

Company Filing History:

goldMedal26 out of 14,454 
 
Applied Materials, Inc.
 patents

Years Active: 2015-2024

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Areas of Expertise:
Substrate Carrier
PVD Films
Superconductive Film
Optoelectronic Devices
Dielectric Films
Aluminum Nitride
Optical Stack
Magnetized Apparatus
Light Wave Separation
Anti-Reflective Coatings
Multi-Patterning
Amorphous Silicon
26 patents (USPTO):Explore Patents
1. 12125728 - Substrate carrier (2024-10-22),
2. 11994800 - Dose reduction of patterned metal oxide photoresists (2024-05-28),
3. 11802349 - Method for depositing high quality PVD films (2023-10-31),
4. 11778926 - Method and apparatus for deposition of multilayer device with superconductive film (2023-10-03),
5. 11739418 - Method and apparatus for deposition of metal nitrides (2023-08-29),
6. 11575071 - Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and electronic devices (2023-02-07),
7. 11550222 - Dose reduction of patterned metal oxide photoresists (2023-01-10),
8. 11495461 - Film stack for lithography applications (2022-11-08),
9. 11437559 - Method and apparatus for deposition of multilayer device with superconductive film (2022-09-06),
10. 11313034 - Methods for depositing amorphous silicon layers or silicon oxycarbide layers via physical vapor deposition (2022-04-26),
11. 11081623 - Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices (2021-08-03),
12. 11056277 - Magnetized substrate carrier apparatus with shadow mask for deposition (2021-07-06),
13. 10886155 - Optical stack deposition and on-board metrology (2021-01-05),
14. D904640 - Substrate carrier (2020-12-08),
15. 10546973 - Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices (2020-01-28),

Title: Daniel Lee Diehl - Innovative Inventor from Chiba, JP

Introduction: Daniel Lee Diehl is a renowned inventor based in Chiba, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Daniel Lee Diehl holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach.

Career Highlights: With over two decades of experience in the innovation industry, Daniel Lee Diehl has worked with leading research institutions and companies to develop cutting-edge solutions that have revolutionized the way we approach modern challenges.

Collaborations: Throughout his career, Daniel Lee Diehl has collaborated with top engineers, scientists, and inventors from around the world, fostering a culture of creativity and excellence in all his projects.

Conclusion: Daniel Lee Diehl's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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