The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2021
Filed:
Jan. 16, 2019
Applied Materials, Inc., Santa Clara, CA (US);
Mingwei Zhu, San Jose, CA (US);
Zihao Yang, Santa Clara, CA (US);
Nag B. Patibandla, Pleasanton, CA (US);
Daniel Lee Diehl, Chiba, JP;
Yong Cao, San Jose, CA (US);
Weimin Zeng, San Jose, CA (US);
Renjing Zheng, San Jose, CA (US);
Edward Budiarto, Fremont, CA (US);
Surender Kumar Gurusamy, Santa Clara, CA (US);
Todd Egan, Fremont, CA (US);
Niranjan R. Khasgiwale, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for forming an optical stack having uniform and accurate layers is provided. A processing tool used to form the optical stack comprises, within an enclosed environment, a first transfer chamber, an on-board metrology unit, and a second transfer chamber. A first plurality of processing chambers is coupled to the first transfer chamber or the second transfer chamber. The on-board metrology unit is disposed between the first transfer chamber and the second transfer chamber. The on-board metrology unit is configured to measure one or more optical properties of the individual layers of the optical stack without exposing the layers to an ambient environment.