The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2023
Filed:
Mar. 18, 2020
Applied Materials, Inc, Santa Clara, CA (US);
Mingwei Zhu, San Jose, CA (US);
Zihao Yang, Santa Clara, CA (US);
Nag B. Patibandla, Pleasanton, CA (US);
Ludovic Godet, Sunnyvale, CA (US);
Yong Cao, San Jose, CA (US);
Daniel Lee Diehl, Chiba, JP;
Zhebo Chen, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A structure including a metal nitride layer is formed on a workpiece by pre-conditioning a chamber that includes a metal target by flowing nitrogen gas and an inert gas at a first flow rate ratio into the chamber and igniting a plasma in the chamber before placing the workpiece in the chamber, evacuating the chamber after the preconditioning, placing the workpiece on a workpiece support in the chamber after the preconditioning, and performing physical vapor deposition of a metal nitride layer on the workpiece in the chamber by flowing nitrogen gas and the inert gas at a second flow rate ratio into the chamber and igniting a plasma in the chamber. The second flow rate ratio is less than the first flow rate ratio.