The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2023
Filed:
Sep. 10, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Zihao Yang, Santa Clara, CA (US);
Mingwei Zhu, San Jose, CA (US);
Nag B. Patibandla, Pleasanton, CA (US);
Yong Cao, San Jose, CA (US);
Shumao Zhang, San Jose, CA (US);
Zhebo Chen, San Jose, CA (US);
Jean Lu, Palo Alto, CA (US);
Daniel Lee Diehl, Chiba, JP;
Xianmin Tang, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments described herein include a method for depositing a material layer on a substrate while controlling a bow of the substrate and a surface roughness of the material layer. A bias applied to the substrate while the material layer is deposited is adjusted to control the bow of the substrate. A bombardment process is performed on the material layer to improve the surface roughness of the material layer. The bias and bombardment process improve a uniformity of the material layer and reduce an occurrence of the material layer cracking due to the bow of the substrate.